26 March 1993 Optimizing continuous improvement in the semiconductor industry
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Proceedings Volume 1809, 12th Annual BACUS Symposium on Photomask Technology and Management; (1993); doi: 10.1117/12.142141
Event: Photomask Technology, 1992, Sunnyville, CA, United States
Abstract
This paper covers what the Council for Continuous Improvement (CCI) has learned about the most cost effective way of implementing Continuous Improvement and how, in doing so, it will have the greatest impact on your company.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Patrick Reilly, "Optimizing continuous improvement in the semiconductor industry", Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142141; https://doi.org/10.1117/12.142141
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