26 March 1993 Performance testing and results of the first Etec CORE-2564
Author Affiliations +
Abstract
In order to be able to write 64 megabit DRAM reticles, to prepare to write 256 megabit DRAM reticles and in general to meet the current and next generation mask and reticle quality requirements, Hoya Micro Mask (HMM) installed in 1991 the first CORE-2564 Laser Reticle Writer from Etec Systems, Inc. The system was delivered as a CORE-2500XP and was subsequently upgraded to a 2564. The CORE (Custom Optical Reticle Engraver) system produces photomasks with an exposure strategy similar to that employed by an electron beam system, but it uses a laser beam to deliver the photoresist exposure energy. Since then the 2564 has been tested by Etec's standard Acceptance Test Procedure and by several supplementary HMM techniques to insure performance to all the Etec advertised specifications and certain additional HMM requirements that were more demanding and/or more thorough than the advertised specifications. The primary purpose of the HMM tests was to more closely duplicate mask usage. The performance aspects covered by the tests include registration accuracy and repeatability; linewidth accuracy, uniformity and linearity; stripe butting; stripe and scan linearity; edge quality; system cleanliness; minimum geometry resolution; minimum address size and plate loading accuracy and repeatability.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. Edward Franks, C. Edward Franks, Asao Shikata, Asao Shikata, Catherine A. Baker, Catherine A. Baker, } "Performance testing and results of the first Etec CORE-2564", Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142129; https://doi.org/10.1117/12.142129
PROCEEDINGS
12 PAGES


SHARE
RELATED CONTENT

Improved throughput in 0.6-NA laser reticle writers
Proceedings of SPIE (January 22 2001)
1996 mask industry quality assessment
Proceedings of SPIE (December 27 1996)
Investigation of GMC for CD uniformity benefits
Proceedings of SPIE (December 08 1995)
Scattered light in photolithographic lenses
Proceedings of SPIE (May 17 1994)
Zero-bias PBS process for 5X reticles
Proceedings of SPIE (January 01 1992)

Back to Top