Status of x-ray mask inspection and repair

Steven C. Nash; James P. Levin; O. De Hodgins

doi:10.1117/12.142140

26 March 1993 Status of x-ray mask inspection and repair

Steven C. Nash, James P. Levin, O. De Hodgins

Proceedings Volume 1809, 12th Annual BACUS Symposium on Photomask Technology and Management; (1993) https://doi.org/10.1117/12.142140
Event: Photomask Technology, 1992, Sunnyville, CA, United States

Abstract

The status of x-ray mask inspection and repair at the IBM Advanced Mask Facility is presented. Defect classification and sources are presented along with some preliminary results from a defect printing study done at the Advanced Lithography Facility.

Citation Download Citation

Steven C. Nash, James P. Levin, and O. De Hodgins "Status of x-ray mask inspection and repair", Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); https://doi.org/10.1117/12.142140

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