Efficient long-pulse excimer lasers at 222 and 308 nm

Jean-Marc Hueber; N. Bernard; Bernard L. Fontaine; Philippe Ch. Delaporte

doi:10.1117/12.144669

4 May 1993 Efficient long-pulse excimer lasers at 222 and 308 nm

Jean-Marc Hueber, N. Bernard, Bernard L. Fontaine, Philippe Ch. Delaporte

Proceedings Volume 1810, 9th International Symposium on Gas Flow and Chemical Lasers; (1993) https://doi.org/10.1117/12.144669
Event: Ninth International Symposium on Gas Flow and Chemical Lasers, 1992, Heraklion, Greece

Abstract

Improvement in efficiency and specific output energy on an XeCl long pulse laser ((lambda) equals 308 nm) and the first achievement of long pulse (150 ns FWHM) laser emission from KrCl (B - > X) at (lambda) equals 222 nm are reported. The system, which includes x- ray preionization and double discharge (pulser/sustainer) excitation, allows potentially high laser efficiency from a small volume active medium with relatively low pressure Ne/Xe/HCl, Ne/Xe/BCl₃, Ne/Kr/HCl and Ne/Kr/BCl₃ working mixtures.

Citation Download Citation

Jean-Marc Hueber, N. Bernard, Bernard L. Fontaine, and Philippe Ch. Delaporte "Efficient long-pulse excimer lasers at 222 and 308 nm", Proc. SPIE 1810, 9th International Symposium on Gas Flow and Chemical Lasers, (4 May 1993); https://doi.org/10.1117/12.144669

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