Translator Disclaimer
4 May 1993 Repetitively pulsed HF chemical laser with high average power
Author Affiliations +
Proceedings Volume 1810, 9th International Symposium on Gas Flow and Chemical Lasers; (1993) https://doi.org/10.1117/12.144647
Event: Ninth International Symposium on Gas Flow and Chemical Lasers, 1992, Heraklion, Greece
Abstract
A compact, repetitively pulsed HF chemical laser, built with a gas recirculator loop to cool and process the gas mixture, is described. A simple corona phototriggered discharge operating in SF6/C2H6/Ne gas mixture is used to produce vibrationally excited HF molecules at typical pressures of 90 - 150 Torr. This laser produced over 5 J per pulse in single shot operation and a maximum average power of 500 W at a repetition rate of 110 Hz. The electrical efficiency is 3%.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henri Brunet, Michel Mabru, and C. Vannier "Repetitively pulsed HF chemical laser with high average power", Proc. SPIE 1810, 9th International Symposium on Gas Flow and Chemical Lasers, (4 May 1993); https://doi.org/10.1117/12.144647
PROCEEDINGS
4 PAGES


SHARE
Advertisement
Advertisement
Back to Top