4 May 1993 Repetitively pulsed HF chemical laser with high average power
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Proceedings Volume 1810, 9th International Symposium on Gas Flow and Chemical Lasers; (1993) https://doi.org/10.1117/12.144647
Event: Ninth International Symposium on Gas Flow and Chemical Lasers, 1992, Heraklion, Greece
Abstract
A compact, repetitively pulsed HF chemical laser, built with a gas recirculator loop to cool and process the gas mixture, is described. A simple corona phototriggered discharge operating in SF6/C2H6/Ne gas mixture is used to produce vibrationally excited HF molecules at typical pressures of 90 - 150 Torr. This laser produced over 5 J per pulse in single shot operation and a maximum average power of 500 W at a repetition rate of 110 Hz. The electrical efficiency is 3%.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henri Brunet, Henri Brunet, Michel Mabru, Michel Mabru, C. Vannier, C. Vannier, } "Repetitively pulsed HF chemical laser with high average power", Proc. SPIE 1810, 9th International Symposium on Gas Flow and Chemical Lasers, (4 May 1993); doi: 10.1117/12.144647; https://doi.org/10.1117/12.144647
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