28 May 1993 Computer modeling of data processing method for optical control of the thin-film structures in lithography
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Proceedings Volume 1821, Industrial Applications of Optical Inspection, Metrology, and Sensing; (1993); doi: 10.1117/12.145568
Event: Applications in Optical Science and Engineering, 1992, Boston, MA, United States
Abstract
Progress in development of the advanced optical materials for window applications requires the necessity of creating non-contact optical methods to characterize properties of thin film materials and their structures. Many existing systems for scanning control such optical thin films structures have limited spatial resolution as laser shift interferometers or need to be calibrated as methods of the intensivity distribution registration in diffraction orders. Some attempts and demonstrations to increase spatial resolution of the phase microscopes have been made. However the field amplitude-phase methods of surface/structure registration contain from theoretical point much more possibilities. The necessity of creating direct real time scanning methods to control thin films structures in the mode of registration coinciding with operation mode of their industrial application with appropriate for this application spatial resolution has stimulated preparing of this paper.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yury Snezhko, "Computer modeling of data processing method for optical control of the thin-film structures in lithography", Proc. SPIE 1821, Industrial Applications of Optical Inspection, Metrology, and Sensing, (28 May 1993); doi: 10.1117/12.145568; https://doi.org/10.1117/12.145568
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KEYWORDS
Thin films

Reflectors

Data processing

Computer simulations

Photodetectors

Lithography

Refraction

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