Interferogram Analysis For Space Optics

John S. Loomis

doi:10.1117/12.957405

27 September 1979 Interferogram Analysis For Space Optics

John S. Loomis

Proceedings Volume 0183, Space Optics II; (1979) https://doi.org/10.1117/12.957405
Event: 1979 Huntsville Technical Symposium, 1979, Huntsville, United States

Abstract

Interferometry of optical surfaces, components, and systems is used extensively by the optical industry in fabrication, quality control, and system assembly and alignment. The use of digital techniques to analyze interferograms has increased in the past few years. Sophisticated analysis techniques using micro-computers may be used by even the smallest optical shop. Digital instrumentation can be used to evaluate large numbers of interferograms. Optical quality of diffraction-limited systems is bounded by the root-mean-square wavefront departure from the appropriate reference sphere. The geometric ray properties are bounded by the maximum slope of the wavefront. The specification and evaluation of space optics often rest on these properties. Both the rms wavefront and the maximum slope of the wavefront can be determined from interferometric measurements.

Citation Download Citation

John S. Loomis "Interferogram Analysis For Space Optics", Proc. SPIE 0183, Space Optics II, (27 September 1979); https://doi.org/10.1117/12.957405

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