19 April 1993 Ion beams by an XeCl laser having a novel electrodes scheme
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Proceedings Volume 1835, Excimer Lasers: Applications, Beam Delivery Systems, and Laser Design; (1993) https://doi.org/10.1117/12.143043
Event: Applications in Optical Science and Engineering, 1992, Boston, MA, United States
Abstract
In this experimental work, a new and very compact home made XeCl laser has been used for the ion beam generation by metallic targets. Multiply-charge heavy ion pulses have been extracted by the plasma produced by a focused laser beam at relatively low flux (approximately 30 MW/cm2) on Si, Ge, Mg and Zn targets. An output peak current of Si3+ ions of 375 mA has been recorded at an acceleration voltage of 200 V only. The insertion of a variable capacitance between the target holder and the acceleration electrode allowed a self-bunching of the ion beam. Besides, a peak current of 1.4 A of Pb3+ ions was obtained by increasing the laser flux to 86 MW/cm2 and the acceleration voltage to 500 V.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vincenzo Nassisi, A. Pecoraro, "Ion beams by an XeCl laser having a novel electrodes scheme", Proc. SPIE 1835, Excimer Lasers: Applications, Beam Delivery Systems, and Laser Design, (19 April 1993); doi: 10.1117/12.143043; https://doi.org/10.1117/12.143043
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