9 August 1979 X-Ray Scattering From Epoxy Replica Surfaces
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Proceedings Volume 0184, Space Optics Imaging X-Ray Optics Workshop; (1979) https://doi.org/10.1117/12.957450
Event: 1979 Huntsville Technical Symposium, 1979, Huntsville, United States
Abstract
A research programme, with the objective to manufacture optical surfaces with a very low X-ray scattering level by means of the epoxy replica technique, has been carried out. X-ray scattering measurements at 44, 13.3 and 8.3 X on a variety of optical surfaces down to a r.m.s. roughness of about 2.0 X, have been performed and results are presented. The dependence of the measured X-ray scattering level on various replica production parameters, i.e.: master surface roughness, epoxy curing temperature, epoxy thickness and substrate surface roughness are discussed.
© (1979) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. A. J. de Korte, P. A. J. de Korte, "X-Ray Scattering From Epoxy Replica Surfaces", Proc. SPIE 0184, Space Optics Imaging X-Ray Optics Workshop, (9 August 1979); doi: 10.1117/12.957450; https://doi.org/10.1117/12.957450
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