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24 June 1993 Absorption and damage thresholds of low-defect-density hafnia deposited with activated oxygen
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Abstract
Motivation for this work included observations at Lawrence Livermore National Laboratory and elsewhere of a correlation between increasing laser damage thresholds (DT) and both decreasing nodular-defect density and absorption of coatings. We reduced the nodular-defect densities by a factor of over 4x in hafnia (HfO2) coatings deposited by reactive e-beam evaporation from a Hf target source. In order to increase the metal oxidation kinetics at the coated surface, Hf was e-beam deposited reactively with O2 activated by a (mu) -wave discharge. The effect of using activated O2 during the evaporation of a HfO2 target source was also evaluated. A series of HfO2 layers were made with various conditions; we alternated between two (mu) -wave configurations, Hf and HfO2 targets and two reactive O2 pressures. Laser DTs (1064 nm - 10 ns pulses), absorption (at 511 nm), and nodular- defect densities from these coatings are reported. The DT correlated inversely with the coating absorption.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert Chow, Steven Falabella, Gary E. Loomis, Frank Rainer, Christopher J. Stolz, and Mark R. Kozlowski "Absorption and damage thresholds of low-defect-density hafnia deposited with activated oxygen", Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); https://doi.org/10.1117/12.147409
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