Paper
24 June 1993 Damage thresholds of AR coating on subsurface-damage-removed fused silica glass
Kunio Yoshida, Kanyoshi Ochi, Hidetsugu Yoshida, Minoru Ohtani, M. Sawamura
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Abstract
We have developed a coating chamber (diameter of 1600 mm(phi )) including ion guns for removal of subsurface which can deposit on the substrate of the maximum diameter of 800 mm (phi ). The damage threshold of AR coating on subsurface removed fused silica glass of 800 mm(phi ) showed 7 J/cm2 at 355 nm, pulsewidth of 0.3 ns. (Abstract only)
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kunio Yoshida, Kanyoshi Ochi, Hidetsugu Yoshida, Minoru Ohtani, and M. Sawamura "Damage thresholds of AR coating on subsurface-damage-removed fused silica glass", Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); https://doi.org/10.1117/12.147390
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KEYWORDS
Antireflective coatings

Silica

Glasses

Ions

Laser damage threshold

Coating

Etching

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