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24 June 1993 High-threshold fluoride AR coatings for KDP crystal at 352 nm
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Abstract
The laser damage thresholds and other properties of 352 nm fluoride AR coatings for KDP substrate were investigated. The HoF3 (or LaF3)/AlF3 AR coating deposited by IAD process had a high threshold of 24 J/cm2 (10 ns) when the laser conditioning procedure was used. These fluoride ARs were durable for wiping and also did not degrade during more than one year under room atmosphere.
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Takao Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Kunio Yoshida, and Hidetsugu Yoshida "High-threshold fluoride AR coatings for KDP crystal at 352 nm", Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); https://doi.org/10.1117/12.147437
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