24 June 1993 Laser plasma sources for soft x-ray projection lithography
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Abstract
Compact laser plasma soft x-ray sources are under serious consideration for projection lithography. Current baseline designs for soft x-ray projection lithography systems place stringent performance and cost requirements on a laser plasma soft x-ray source. The x-ray source must meet specific criteria relating to x-ray fluence in the 13 nm region, the wavelength of preference for projection lithography, to output stability at high (kHz) repetition-rates, to continuous long term operation and to operating costs. Moreover the source must operate in a vacuum enclosure in close proximity to costly x-ray and optical elements which must remain in pristine condition, free from degradation by particulate and plasma emission emanating from the source. We discuss these requirements, and review experiments leading to the optimal design of a laser plasma soft x-ray source.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Martin C. Richardson, William T. Silfvast, Howard Bender, Art Hanzo, Feng Jin, Victor P. Yanovsky, "Laser plasma sources for soft x-ray projection lithography", Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); doi: 10.1117/12.147392; https://doi.org/10.1117/12.147392
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