Translator Disclaimer
24 June 1993 Optical degradation issues for XUV projection lithography systems
Author Affiliations +
Abstract
We review the degradation susceptibility of the various optical components proposed for use in XUV projection lithography systems at 13 - 20 nm. Contamination by laser plasma target debris and carbonaceous films are two primary hazards that must be essentially nullified. Pertinent experimental results of a number of researchers illustrate the present status.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Brian Emerson Newnam "Optical degradation issues for XUV projection lithography systems", Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); https://doi.org/10.1117/12.147391
PROCEEDINGS
9 PAGES


SHARE
Advertisement
Advertisement
Back to Top