Photodisplacement studies of the incubation behavior of oxide coatings on fused silica at 248 nm

Zhouling Wu; Eckart Matthias

doi:10.1117/12.147401

24 June 1993 Photodisplacement studies of the incubation behavior of oxide coatings on fused silica at 248 nm

Zhouling Wu, Eckart Matthias

Proceedings Volume 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992; (1993) https://doi.org/10.1117/12.147401
Event: Optical Materials for High Power Lasers, 1992, Boulder, CO, United States

Abstract

The photodisplacement technique was applied to investigate incubation effects in 500 nm TiO₂, ZrO₂, and HfO₂ coatings for single laser shots of 248 nm at fluences below the damage threshold. This technique is uniquely suited for incubation studies because of its sensitivity for tracing weak optical absorption with high spatial resolution. For varying fluences the single shot incubation behaves differently in these oxides and seems to correlate with the band gap. In TiO₂, where the band gap is smaller compared to the photon energy, the absorption increases exponentially with laser fluence. For ZrO₂ and HfO₂ with band gaps apparently larger than the photon energy, the absorption saturates at a fluence corresponding to about 30% of the damage threshold. We take this as evidence that the incubation mechanism differs whenever the photon energies are smaller or larger than the band gap.

Citation Download Citation

Zhouling Wu and Eckart Matthias "Photodisplacement studies of the incubation behavior of oxide coatings on fused silica at 248 nm", Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); https://doi.org/10.1117/12.147401

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