24 June 1993 Photodisplacement studies of the incubation behavior of oxide coatings on fused silica at 248 nm
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The photodisplacement technique was applied to investigate incubation effects in 500 nm TiO2, ZrO2, and HfO2 coatings for single laser shots of 248 nm at fluences below the damage threshold. This technique is uniquely suited for incubation studies because of its sensitivity for tracing weak optical absorption with high spatial resolution. For varying fluences the single shot incubation behaves differently in these oxides and seems to correlate with the band gap. In TiO2, where the band gap is smaller compared to the photon energy, the absorption increases exponentially with laser fluence. For ZrO2 and HfO2 with band gaps apparently larger than the photon energy, the absorption saturates at a fluence corresponding to about 30% of the damage threshold. We take this as evidence that the incubation mechanism differs whenever the photon energies are smaller or larger than the band gap.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhouling Wu, Zhouling Wu, Eckart Matthias, Eckart Matthias, } "Photodisplacement studies of the incubation behavior of oxide coatings on fused silica at 248 nm", Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); doi: 10.1117/12.147401; https://doi.org/10.1117/12.147401


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