24 June 1993 Photothermal comparison of reactive low-voltage ion-plated and electron-beam-deposited TiO2 thin films
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Abstract
TiO2 thin films of different thicknesses were prepared by conventional electron beam deposition (EBD) and reactive low-voltage ion-plating (RLVIP) techniques. These samples were designed to investigate the thickness dependent optical and thermal properties of the TiO2 coatings and the corresponding damage thresholds. In this paper we present a detailed comparison of the two groups of samples by using various photothermal techniques. The data reported include thermal conductivity, defect density, optical absorption, laser damage threshold, as well as laser conditioning effect by using Ar+ laser irradiation. The general trend shown by the data is that the ion-plated samples have higher absorption, lower damage threshold, yet better thermal conductivity, lower defect density, and almost perfect stability under Ar+ laser irradiation.
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Zhouling Wu, Zhouling Wu, Eckart Matthias, Eckart Matthias, A. Messinger, A. Messinger, Klaus Bange, Klaus Bange, } "Photothermal comparison of reactive low-voltage ion-plated and electron-beam-deposited TiO2 thin films", Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); doi: 10.1117/12.147428; https://doi.org/10.1117/12.147428
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