24 June 1993 Formation of microrelief on silicon surface under action of radiation pulses with different polarization
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Proceedings Volume 1856, Laser Radiation Photophysics; (1993) https://doi.org/10.1117/12.147625
Event: OE/LASE'93: Optics, Electro-Optics, and Laser Applications in Scienceand Engineering, 1993, Los Angeles, CA, United States
Abstract
The regular structures formation on a silicon surface under the millisecond pulse of linear- polarized, circular-polarized and unpolarized Nd-laser light irradiation has been studied experimentally. The surface structures induced by the interference of incident wave and surface electromagnetic waves and also the double- and triple-period structures with periods d equals 2 - 3 microns were observed in the nonhomogeneous melting regime. The diffraction pattern separation at higher incident fluence and incident angles have been observed. The main peculiarities of the surface structures formation were explained by polaritonic mechanism.
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Vladimir S. Makin, Vladimir S. Makin, Oleg P. Gashkov, Oleg P. Gashkov, Mikhail N. Libenson, Mikhail N. Libenson, Vladimir V. Trubaev, Vladimir V. Trubaev, } "Formation of microrelief on silicon surface under action of radiation pulses with different polarization", Proc. SPIE 1856, Laser Radiation Photophysics, (24 June 1993); doi: 10.1117/12.147625; https://doi.org/10.1117/12.147625
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