28 May 1993 Dielectric breakdown threshold in CF3H and in CF3H/CF3T mixtures using pulsed infrared radiation
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Proceedings Volume 1859, Laser Isotope Separation; (1993) https://doi.org/10.1117/12.145499
Event: OE/LASE'93: Optics, Electro-Optics, and Laser Applications in Scienceand Engineering, 1993, Los Angeles, CA, United States
Abstract
Pressure dependence of threshold fluences for dielectric breakdown of pure CF3H and CF3H/CF3T mixtures has been studied using 10.6 micrometers pulses from a TEA CO2 laser. Breakdown thresholds are well above the working fluences required for laser isotope separation of trifluoromethane, allowing the use of tight focused geometries without producing nonselective processes. Analysis of the experimental results suggests that breakdown occurs as a result of a cascade process, and that recombination losses are more important than electron diffusion. In the pressure range studied, the threshold in presence of CF3T was lower than the corresponding value in pure CF3H, as a consequence of the preionization induced by the (beta) decay.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Elizabeth M. Alonso, John A. O'Neill, Lucien Pateopol, "Dielectric breakdown threshold in CF3H and in CF3H/CF3T mixtures using pulsed infrared radiation", Proc. SPIE 1859, Laser Isotope Separation, (28 May 1993); doi: 10.1117/12.145499; https://doi.org/10.1117/12.145499
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