13 August 1993 Design and manufacture of optical system for use in ultraviolet lithography with the free-electron laser
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Proceedings Volume 1868, Laser Resonators and Coherent Optics: Modeling, Technology, and Applications; (1993); doi: 10.1117/12.150634
Event: OE/LASE'93: Optics, Electro-Optics, and Laser Applications in Scienceand Engineering, 1993, Los Angeles, CA, United States
Abstract
At Los Alamos National Laboratory, we are preparing to image submicrometer-size features using the Free Electron Laser (FEL) operating at 248 nm. This article describes the optical transfer systems that were designed to relay the ultraviolet (UV) optical output of the FEL, resulting in expected imaged feature sizes in the range 0.3 - 0.5 micrometers . Nearly all optical subsystems are reflective, and once the coatings were optimized any optical wavelength could be used. All refractive optics were UV-grade fused silica. The optical design, engineering, and manufacture of the various component systems are described along with some experimental results.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Donald A. Byrd, Vriddhachalam K. Viswanathan, Gregg L. Woodfin, William W. Horn, Vito J. Lazazzera, Rodney A. Schmell, "Design and manufacture of optical system for use in ultraviolet lithography with the free-electron laser", Proc. SPIE 1868, Laser Resonators and Coherent Optics: Modeling, Technology, and Applications, (13 August 1993); doi: 10.1117/12.150634; https://doi.org/10.1117/12.150634
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KEYWORDS
Photomasks

Optics manufacturing

Resonators

Free electron lasers

Relays

Lithography

Telescopes

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