1 May 1993 Phase plates in the object plane for microlithography
Author Affiliations +
Proceedings Volume 1870, Laser Coherence Control: Technology and Applications; (1993) https://doi.org/10.1117/12.154478
Event: OE/LASE'93: Optics, Electro-Optics, and Laser Applications in Scienceand Engineering, 1993, Los Angeles, CA, United States
Abstract
Phase-shifting masks, which have many similarities to the phase plates used to smooth laser beams, are being developed to project high-contrast patterns for semiconductor manufacturing.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David Levenson, David Levenson, } "Phase plates in the object plane for microlithography", Proc. SPIE 1870, Laser Coherence Control: Technology and Applications, (1 May 1993); doi: 10.1117/12.154478; https://doi.org/10.1117/12.154478
PROCEEDINGS
8 PAGES


SHARE
RELATED CONTENT

Study on overlay AEI ADI shift on contact layer of...
Proceedings of SPIE (March 07 2016)
Positive Versus Negative: A Photoresist Analysis
Proceedings of SPIE (July 27 1981)
Computer Optimized Mask Making
Proceedings of SPIE (August 07 1977)
Optical lithography with chromeless phase-shifted masks
Proceedings of SPIE (June 30 1991)

Back to Top