15 July 1993 MMW modeling and measurement of targets and materials
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Proceedings Volume 1874, Infrared and Millimeter-Wave Engineering; (1993) https://doi.org/10.1117/12.148073
Event: OE/LASE'93: Optics, Electro-Optics, and Laser Applications in Scienceand Engineering, 1993, Los Angeles, CA, United States
Abstract
The rf technology section of the Seeker Technology Branch is developing an in-house capability for modeling and measurement of target scattering and material characteristics at millimeter wave (mmW) frequencies. The goal of the modeling effort is to understand the basic mechanisms that contribute to the target scattering (coated and uncoated) at mmW frequencies. Surface variations can be a significant portion of a wavelength at mmW; therefore, surface roughness must be included in our derivations. We are developing theoretical target models for canonical shapes such as plates and spheroids. These models will be bistatic, fully polarimetric (to account for depolarization) and include surface roughness. In a parallel effort, we are developing models for the material parameters [(mu) ((omega) ) and (epsilon) ((omega) )] that are valid in the mmW region. Our measurement effort is two-fold: To verify theoretical models (target and materials), and to assess the effectiveness of actual countermeasures. This paper discusses our current hardware configuration, planned upgrades, outlines our modeling effort, and shows examples of the Millimeter-Wave Reflectivity Measurement System measurements.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Keith D. Trott, Keith D. Trott, John R. Walker, John R. Walker, } "MMW modeling and measurement of targets and materials", Proc. SPIE 1874, Infrared and Millimeter-Wave Engineering, (15 July 1993); doi: 10.1117/12.148073; https://doi.org/10.1117/12.148073
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