24 June 1993 Development of a polycapillary collimator for point-source x-ray lithography
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Abstract
A collimated radiation field is desired in order to use x-ray lithography to replicate ULSI chips with sub-0.25 micrometers features. Additional field specifications include uniformity of x-ray intensity (+/- 1%), penumbral blur (5 mrad), field size greater than 25 mm X 25 mm, and high x-ray transmission efficiency. Introduction of a multi-polycapillary x-ray wave guide collimator between a laser plasma x-ray source and silicon wafer can produce such a field. We describe progress toward the design and fabrication of such a collimator. We have measured the soft x-ray transmission efficiency and divergence of straight and bent glass polycapillaries composed of capillaries in the 17 - 25 micrometers diameter range, using a laser produced plasma x-ray spectrum peaked at 14 angstroms. Transmission results conform well to theoretical predictions. Experimental results have been used to develop a preliminary design for a polycapillary collimeter structure that can be used with Hampshire Instruments' x-ray lithography stepper systems. The projected x-ray field characteristics, and throughput are discussed.
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Michael H. Vartanian, David M. Gibson, Robert D. Frankel, Jerry P. Drumheller, "Development of a polycapillary collimator for point-source x-ray lithography", Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); doi: 10.1117/12.146531; https://doi.org/10.1117/12.146531
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