24 June 1993 Development of a polycapillary collimator for point-source x-ray lithography
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Abstract
A collimated radiation field is desired in order to use x-ray lithography to replicate ULSI chips with sub-0.25 micrometers features. Additional field specifications include uniformity of x-ray intensity (+/- 1%), penumbral blur (5 mrad), field size greater than 25 mm X 25 mm, and high x-ray transmission efficiency. Introduction of a multi-polycapillary x-ray wave guide collimator between a laser plasma x-ray source and silicon wafer can produce such a field. We describe progress toward the design and fabrication of such a collimator. We have measured the soft x-ray transmission efficiency and divergence of straight and bent glass polycapillaries composed of capillaries in the 17 - 25 micrometers diameter range, using a laser produced plasma x-ray spectrum peaked at 14 angstroms. Transmission results conform well to theoretical predictions. Experimental results have been used to develop a preliminary design for a polycapillary collimeter structure that can be used with Hampshire Instruments' x-ray lithography stepper systems. The projected x-ray field characteristics, and throughput are discussed.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael H. Vartanian, Michael H. Vartanian, David M. Gibson, David M. Gibson, Robert D. Frankel, Robert D. Frankel, Jerry P. Drumheller, Jerry P. Drumheller, } "Development of a polycapillary collimator for point-source x-ray lithography", Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); doi: 10.1117/12.146531; https://doi.org/10.1117/12.146531
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