24 June 1993 Film life enhancement of chemically amplified electron-beam resists
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Abstract
A key resist requirement for electron beam sensitive resists is an extended film life of up to 12 weeks, the demands of which far exceed the reported film life of current high resolution acid catalyzed electron beam sensitive resists. Simple techniques are described which increase the coated film life of acid catalyzed electron beam resists, specifically MICROPOSITTM SALTM603 E-Beam Resist, to greater than 12 weeks. Evidence shows that water in the resist film is the likely cause of decreasing resist sensitivity. Finally, it is demonstrated that electron beam sensitive negative acid catalyzed resists have sufficient film life stability to be a viable choice for routine mask making applications.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Theodore H. Fedynyshyn, Michael Francis Cronin, James W. Thackeray, "Film life enhancement of chemically amplified electron-beam resists", Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); doi: 10.1117/12.146533; https://doi.org/10.1117/12.146533
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