15 September 1993 Blended novolac resins with improved lithographic performance
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Statistically designed experiments were performed to optimize novolac blending techniques which would yield superior photoresists. The best lithographic performance was obtained when two novolacs to be blended had dissimilar relative molecular weights (RMW) while also having matched dissolution rates (DR), (lithographic performance equals (RMWA - RMWB)/(DRA - DRB). A calculated plot of (RMWA - RMWB)/(DRA - DRB) matched the experimental plot of lithographic performance well.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas J. Lynch, Thomas J. Lynch, Chet J. Sobodacha, Chet J. Sobodacha, Valerie R. Paradis, Valerie R. Paradis, Dana L. Durham, Dana L. Durham, Anthony Canize, Anthony Canize, } "Blended novolac resins with improved lithographic performance", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); doi: 10.1117/12.154795; https://doi.org/10.1117/12.154795

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