Influence of polymer properties on airborne chemical contamination of chemically amplified resists

William D. Hinsberg; Scott A. MacDonald; Nicholas J. Clecak; Clinton D. Snyder; Hiroshi Ito

doi:10.1117/12.154774

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15 September 1993 Influence of polymer properties on airborne chemical contamination of chemically amplified resists

William D. Hinsberg, Scott A. MacDonald, Nicholas J. Clecak, Clinton D. Snyder, Hiroshi Ito

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Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154774
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

We describe here an extensive study of the relation between polymer structure and rates of NMP uptake for a set of polymer films with a very broad range of properties. NMP labeled using radioactive ¹⁴C was introduced at a concentration of 12 ppb into a stream of purified air. The film of interest was then immersed in the airstream for a predetermined time under controlled conditions. The radionuclide serves as a tag which allows precise quantitation of NMP absorbed by the polymer film. NMP uptake rates measured using this method are shown to correlate with polymer physical properties in a straightforward manner. The observed trends are in accord with those expected on the basis of the solution diffusion model of polymer permeation. These data provide a basis for the rational design of polymers for chemically amplified resists which are insensitive to airborne contaminants.

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William D. Hinsberg, Scott A. MacDonald, Nicholas J. Clecak, Clinton D. Snyder, and Hiroshi Ito "Influence of polymer properties on airborne chemical contamination of chemically amplified resists", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154774

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