Study on the over-top-coating suppressing surface insoluble layer generation for chemical amplification resist

Teruhiko Kumada; Youko Tanaka; Akemi Ueyama; Shigeru Kubota; Hiroshi Koezuka; Tetsuro Hanawa; Hiroaki Morimoto

doi:10.1117/12.154764

15 September 1993 Study on the over-top-coating suppressing surface insoluble layer generation for chemical amplification resist

Teruhiko Kumada, Youko Tanaka, Akemi Ueyama, Shigeru Kubota, Hiroshi Koezuka, Tetsuro Hanawa, Hiroaki Morimoto

Author Affiliations +

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154764
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Most positive chemical amplification resists do not have enough stability to process delay. It has been claimed that airborne contaminants neutralize acids from photo-acid generators. It has been found by means of x-ray photoelectron spectroscopy that an onium salt used as a photo-acid generator is deficient at the surface of the prebaked resist film. The over-top coating using water-soluble polymers with organic acids has been investigated in order to not only separate the resist surface from airborne contaminants but also supply acids to the resist surface. We have succeeded in the suppression of the surface insoluble layer generation and of the pattern size change for more than 8 hours.

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Teruhiko Kumada, Youko Tanaka, Akemi Ueyama, Shigeru Kubota, Hiroshi Koezuka, Tetsuro Hanawa, and Hiroaki Morimoto "Study on the over-top-coating suppressing surface insoluble layer generation for chemical amplification resist", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154764

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