4 August 1993 FIB repair of 5x reticles and effects on IC quality
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Focused ion beam repair of opaque defects on 5X reticles cause a post repair stain due mainly to gallium ion implantation in the surface of the quartz substrate. The effects of these stains have been investigated through printability tests using a g-line optical lithography process. In some cases the effect of the post repair stain is worse than that of the original defect, highlighting the need for effective antistain processes for use in conjunction with FIB repair.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Philip D. Prewett, Brian Martin, A. W. Eastwood, John G. Watson, "FIB repair of 5x reticles and effects on IC quality", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); doi: 10.1117/12.148984; https://doi.org/10.1117/12.148984


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