4 August 1993 Measurement of phase-shift masks
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Abstract
We discuss in this paper the use of the confocal microscope and an interferometric microscope for measurement of phase-shift masks. It is shown that phase measurements are more accurate than intensity measurements for determining the depth and slope of the sides of a notch. Results obtained on an isotropically etched mask, with curved bottom corners, are predicted well by our imaging theory. Solid immersion lens techniques for observing a mask from the flat side are demonstrated.
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Fang Cheng Chang, Fang Cheng Chang, Gordon S. Kino, Gordon S. Kino, William K. Studenmund, William K. Studenmund, Stanley S. C. Chim, Stanley S. C. Chim, Ching-Hua Chou, Ching-Hua Chou, } "Measurement of phase-shift masks", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); doi: 10.1117/12.148974; https://doi.org/10.1117/12.148974
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