4 August 1993 Measurement of phase-shift masks
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We discuss in this paper the use of the confocal microscope and an interferometric microscope for measurement of phase-shift masks. It is shown that phase measurements are more accurate than intensity measurements for determining the depth and slope of the sides of a notch. Results obtained on an isotropically etched mask, with curved bottom corners, are predicted well by our imaging theory. Solid immersion lens techniques for observing a mask from the flat side are demonstrated.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fang Cheng Chang, Fang Cheng Chang, Gordon S. Kino, Gordon S. Kino, William K. Studenmund, William K. Studenmund, Stanley S. C. Chim, Stanley S. C. Chim, Ching-Hua Chou, Ching-Hua Chou, "Measurement of phase-shift masks", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); doi: 10.1117/12.148974; https://doi.org/10.1117/12.148974

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