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4 August 1993 Nonlinearity in scanning electron microscope critical dimension measurements introduced by the edge detection algorithm
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Abstract
This paper discusses nonlinear behavior in SEM CD measurements stemming from the interaction of the edge detection algorithm and systematic changes in the appearance of the secondary electron signal. A first-order theory is developed which describes the effect of changes in apparent sidewall slope and baseline level on common edge detection algorithms. Specifically the theory predicts nonlinear behavior for linear approximation and threshold edge detection algorithms. Experimental verification of the effect is presented. Systematic increases in linewidth of 10% are frequently encountered in practice when making measurements in the sub 0.75 micrometers regime.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert R. Hershey and Michael B. Weller "Nonlinearity in scanning electron microscope critical dimension measurements introduced by the edge detection algorithm", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); https://doi.org/10.1117/12.148943
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