PROCEEDINGS VOLUME 1927
SPIE'S 1993 SYMPOSIUM ON MICROLITHOGRAPHY | 28-5 FEBRUARY 1993
Optical/Laser Microlithography
Editor(s): John D. Cuthbert
SPIE'S 1993 SYMPOSIUM ON MICROLITHOGRAPHY
28-5 February 1993
San Jose, CA, United States
Phase-Shift Methods
Proc. SPIE 1927, Comparison of various phase-shift strategies and application to 0.35-um ASIC designs, 0000 (8 August 1993); doi: 10.1117/12.150416
Proc. SPIE 1927, Exposure alignment compensation method for rim phase-shifting mask fabrication, 0000 (8 August 1993); doi: 10.1117/12.150426
Proc. SPIE 1927, Phase-shifting mask topography effects on lithographic image quality, 0000 (8 August 1993); doi: 10.1117/12.150446
Proc. SPIE 1927, Fabrication of 0.1-um T-shaped gates by phase-shifting optical lithography, 0000 (8 August 1993); doi: 10.1117/12.150465
Phase-Shift and Oblique-Illumination Methods
Proc. SPIE 1927, Rim phase-shift mask combined with off-axis illumination: a path to .5lambda/NA geometries, 0000 (8 August 1993); doi: 10.1117/12.150474
Proc. SPIE 1927, Aerial image-based design of rim phase-shift masks with annular illumination, 0000 (8 August 1993); doi: 10.1117/12.150484
Proc. SPIE 1927, Application of phase-shifting mask to DRAM cell capacitor fabrication, 0000 (8 August 1993); doi: 10.1117/12.150490
Proc. SPIE 1927, Off-axis illumination--working principles and comparison with alternating phase-shifting masks, 0000 (8 August 1993); doi: 10.1117/12.150417
Oblique-Illumination Methods
Proc. SPIE 1927, Optimization of the spatial properties of illumination for improved lithographic response, 0000 (8 August 1993); doi: 10.1117/12.150418
Proc. SPIE 1927, 0.35-micron lithography using off-axis illumination, 0000 (8 August 1993); doi: 10.1117/12.150419
Proc. SPIE 1927, Depth of focus and resolution enhancement of i-line and deep-UV lithography using annular illumination, 0000 (8 August 1993); doi: 10.1117/12.150420
Proc. SPIE 1927, Quarter-micron lithography using a deep-UV stepper with modified illumination, 0000 (8 August 1993); doi: 10.1117/12.150421
Proc. SPIE 1927, Effect of lens aberration on oblique-illumination stepper system, 0000 (8 August 1993); doi: 10.1117/12.150422
Phase-Shift, Oblique-Illumination, and Pupil Filter Methods
Proc. SPIE 1927, 170-nm gates fabricated by phase-shift mask and top antireflector process, 0000 (8 August 1993); doi: 10.1117/12.150423
Proc. SPIE 1927, New resolution-enhancing mask for projection lithography based on in-situ off-axis illumination, 0000 (8 August 1993); doi: 10.1117/12.150424
Proc. SPIE 1927, New mask technique for optical lithography--dummy diffraction mask, 0000 (8 August 1993); doi: 10.1117/12.150425
Proc. SPIE 1927, New method of tilted illumination using grating mask: advanced tilted illumination on mask, 0000 (8 August 1993); doi: 10.1117/12.150427
Proc. SPIE 1927, New ring array off-axis illumination system for subhalf-micron lithography, 0000 (8 August 1993); doi: 10.1117/12.150428
I-Line and DUV Lithographies I
Proc. SPIE 1927, Stability of krypton fluoride laser in real stepper mode operation, 0000 (8 August 1993); doi: 10.1117/12.150429
Proc. SPIE 1927, Parametric studies and the operating latitude of a spectrally narrowed KrF excimer laser for the deep-UV stepper, 0000 (8 August 1993); doi: 10.1117/12.150430
Proc. SPIE 1927, Practical resolution enhancement effect by new complete antireflective layer in KrF excimer laser lithography, 0000 (8 August 1993); doi: 10.1117/12.150431
Proc. SPIE 1927, Optimization of antireflection layers for deep-UV lithography, 0000 (8 August 1993); doi: 10.1117/12.150432
Proc. SPIE 1927, 0.35-micron excimer DUV photolithography process, 0000 (8 August 1993); doi: 10.1117/12.150433
Proc. SPIE 1927, I-line lithography for subhalf-micron design rules, 0000 (8 August 1993); doi: 10.1117/12.150434
I-Line and DUV Lithographies II
Proc. SPIE 1927, NA and optimization for high-NA i-line lithography, 0000 (8 August 1993); doi: 10.1117/12.150435
Proc. SPIE 1927, Optimizing NA and sigma for subhalf-micrometer lithography, 0000 (8 August 1993); doi: 10.1117/12.150436
Proc. SPIE 1927, Isolated-grouped linewidth bias on SVGL Micrascan, 0000 (8 August 1993); doi: 10.1117/12.150437
Simulations and Experiments I
Proc. SPIE 1927, Three-dimensional lithography cases for exploring technology solutions and benchmarking simulators, 0000 (8 August 1993); doi: 10.1117/12.150438
Proc. SPIE 1927, Vector diffraction analysis of phase-mask imaging in photoresist films, 0000 (8 August 1993); doi: 10.1117/12.150439
Proc. SPIE 1927, Three-dimensional resist profile simulation, 0000 (8 August 1993); doi: 10.1117/12.150440
Proc. SPIE 1927, Suitability of high-numerical-aperture i-line steppers with oblique illumination for linewidth control in 0.35-um complex circuit patterns, 0000 (8 August 1993); doi: 10.1117/12.150441
Proc. SPIE 1927, Intensity optimization for phase-shifting masks, 0000 (8 August 1993); doi: 10.1117/12.150442
Simulations and Experiments II
Proc. SPIE 1927, Extension of the Hopkins theory of partially coherent imaging to include thin-film interference effects, 0000 (8 August 1993); doi: 10.1117/12.150443
Proc. SPIE 1927, Experiment and simulation of sub-0.25-um resist processes for 193-nm lithography, 0000 (8 August 1993); doi: 10.1117/12.150444
Proc. SPIE 1927, Computer-aided phase-shift mask design with reduced complexity, 0000 (8 August 1993); doi: 10.1117/12.150445
Proc. SPIE 1927, Advanced lithography simulation tools for development and analysis of wide-field high numerical aperture projection optical systems, 0000 (8 August 1993); doi: 10.1117/12.150447
Phase-Contrast Lithography and Overlay
Proc. SPIE 1927, Phase-contrast lithography, 0000 (8 August 1993); doi: 10.1117/12.150448
Proc. SPIE 1927, Phase-contrast lithography, 0000 (8 August 1993); doi: 10.1117/12.150449
Proc. SPIE 1927, Simulating the stitching performance of flat-panel-display steppers, 0000 (8 August 1993); doi: 10.1117/12.150450
Proc. SPIE 1927, Overlay distortions in wafer-scale integration lithography, 0000 (8 August 1993); doi: 10.1117/12.150451
Proc. SPIE 1927, Mask alignment technique using phase-shifted moire signals, 0000 (8 August 1993); doi: 10.1117/12.150452
Advanced Optical Systems
Proc. SPIE 1927, Subhalf-micron stepper with a reticle particle monitor, 0000 (8 August 1993); doi: 10.1117/12.150453
Proc. SPIE 1927, Wide-field deep-UV wafer stepper for 0.35-micron production, 0000 (8 August 1993); doi: 10.1117/12.150454
Proc. SPIE 1927, Performance of a 0.5 NA broadband DUV step-and-scan system, 0000 (8 August 1993); doi: 10.1117/12.150455
Proc. SPIE 1927, Design and analysis of a high-NA projection optical system for 0.35-um deep-UV lithography, 0000 (8 August 1993); doi: 10.1117/12.150456
Poster Session/Reception
Proc. SPIE 1927, Self-aligned rim-type phase-shift mask fabrication by backside exposure, 0000 (8 August 1993); doi: 10.1117/12.150457
Proc. SPIE 1927, Phase-shift reticles for the fabrication of subhalf micron gates in GaAs integrated circuits using optical stepper lithography, 0000 (8 August 1993); doi: 10.1117/12.150458
Proc. SPIE 1927, Multiple shifter arrays for repairing phase defects in conjugate twin-shifter phase-shift mask, 0000 (8 August 1993); doi: 10.1117/12.150459
Proc. SPIE 1927, Determine submicron process window volume with simulator tools, 0000 (8 August 1993); doi: 10.1117/12.150460
Proc. SPIE 1927, Chromeless phase mask by resist silylation for i-line lithography, 0000 (8 August 1993); doi: 10.1117/12.150461
Proc. SPIE 1927, Effect of duty ratio of line and space in phase-shifting lithography, 0000 (8 August 1993); doi: 10.1117/12.150462
Proc. SPIE 1927, Vector aerial image with off-axis illumination, 0000 (8 August 1993); doi: 10.1117/12.150463
Proc. SPIE 1927, Chromeless phase-shift technology: the physical mechanism of the dark area produced by phase compensation and its application, 0000 (8 August 1993); doi: 10.1117/12.150464