8 August 1993 Calibration of lithography simulator by using subresolution patterns
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Proceedings Volume 1927, Optical/Laser Microlithography; (1993); doi: 10.1117/12.150482
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States
Abstract
In this paper, we used actual experimental results to calibrate the 3-D lithography simulator SOLID, a lithography simulator with proven ability to accurately simulate sub-resolution patterns. The RS1 Discover DOE software was used to determine optimum values for the uncertain parameters. The tuned simulator was then used to predict behavior both regular and sub-resolution patterns. The simulation results were compared to actual process data for the final verification.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shay Kaplan, Linard Karklin, "Calibration of lithography simulator by using subresolution patterns", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150482; https://doi.org/10.1117/12.150482
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KEYWORDS
Calibration

Lithography

Solids

Data modeling

Optical lithography

Photomasks

Semiconducting wafers

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