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8 August 1993 Efficient spectral narrowing, tuning, and stabilization devices for KrF laser used in microlithography
Alexander N. Novoselov; Victor G. Nikiforov; Alexander F. Silnitsky; Boris F. Trinchuk
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Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150470
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States
Abstract
Efficient spectral narrowing, tuning, and stabilization devices characterized by improved energy efficiency and operating parameters have been constructed. The devices are used with KrF lasers intended for submicron lithography. Up to 5 pm spectral line narrowing is provided by two Fabry Perot etalons with thoroughly optimized parameters. They permit us to achieve unprecedented spectral narrowing energy efficiency of 50%. A special device based on a passively stabilized reference Fabry-Perot etalon is used for laser wavelength stabilization within 1 pm. A unique optical scheme of interference pattern formation is realized in the device; the laser wavelength is controlled by spatial location of fringes. The device also features precision wavelength tuning (approximately 0.1 pm), better resistance to electromagnetic noise, and higher operating characteristics.
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Alexander N. Novoselov, Victor G. Nikiforov, Alexander F. Silnitsky, and Boris F. Trinchuk "Efficient spectral narrowing, tuning, and stabilization devices for KrF laser used in microlithography", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150470
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