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8 August 1993 New mask technique for optical lithography--dummy diffraction mask
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Abstract
A new mask technique for resolution improvement and depth of focus enhancement is suggested and demonstrated with the simulation and experimental results. The structure of our suggestion has a dummy diffraction layer with simple grating patterns in addition to the main mask for patterning. The lithographic performance of the main mask pattern is largely enhanced and the fabrication of the mask has no critical problems. Through the detailed theoretical expansion of the optics for the new structure, simulation of the aerial image is carried out. And the experiments verify the results of simulation.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yong-Ho Oh, Hyung Joun Yoo, Byung-Sun Park, Zion Cha, Hyo-Joong Kim, and Young Jin Jeon "New mask technique for optical lithography--dummy diffraction mask", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150425
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