Optimization of the spatial properties of illumination for improved lithographic response

Chris A. Mack

doi:10.1117/12.150418

8 August 1993 Optimization of the spatial properties of illumination for improved lithographic response

Chris A. Mack

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150418
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Using computer simulations of the lithographic process, the effects of illuminator modifications are studied. Both symmetric (e.g., annular) and asymmetric (e.g., quadrupole) illumination are discussed and annular illumination is examined in detail. The most significant trade-off in the use of these illuminators is that by optimizing the illumination for one feature size and type, other features may be degraded. Mask linearity also worsens and ceases to be a reliable metric for lithographic quality. The benefit is improved depth-of-focus at the feature size for which the illumination was optimized. These trade-offs are studied in detail and general recommendations for a design approach for the use of different illumination schemes are made.

Citation Download Citation

Chris A. Mack "Optimization of the spatial properties of illumination for improved lithographic response", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150418

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