Parametric studies and the operating latitude of a spectrally narrowed KrF excimer laser for the deep-UV stepper

Uday K. Sengupta; Toshihiko Ishihara; Richard L. Sandstrom

doi:10.1117/12.150430

8 August 1993 Parametric studies and the operating latitude of a spectrally narrowed KrF excimer laser for the deep-UV stepper

Uday K. Sengupta, Toshihiko Ishihara, Richard L. Sandstrom

Author Affiliations +

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150430
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

With the near certainty that the excimer stepper will become one of the lithography tools for printing sub -0.4 micrometers design rule features, it has now become imperative to better understand the performance characteristics of the excimer laser in the context of the total lithography process. It is no longer possible to treat the laser in isolation from the stepper or the resist. The cost of operation for the laser is integrally tied with the stepper specifications, design rule requirements, and resist characteristics. This paper discusses the dependence of laser parameters on stepper performance, and the relationship between various laser operating parameters and specification. In addition, it analyzes the combination of the laser to the lithography process cost per wafer level in terms of design rule requirements and resist characteristics. 15

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Uday K. Sengupta, Toshihiko Ishihara, and Richard L. Sandstrom "Parametric studies and the operating latitude of a spectrally narrowed KrF excimer laser for the deep-UV stepper", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150430

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