Response surface modeling of rim phase-shift masks

Richard D. Holscher; Bruce W. Smith; Steve K. Brainerd

doi:10.1117/12.150483

8 August 1993 Response surface modeling of rim phase-shift masks

Richard D. Holscher, Bruce W. Smith, Steve K. Brainerd

Author Affiliations +

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150483
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

The use of statistically designed experiments provides an efficient method of investigating a lithographic process. Lithographic simulators have also been used as a tool in the investigation of these processes. This paper provides a general methodology for conducting designed experiments in which a computer simulator is the tool used as the data collection device. The rim shifter is a phase shifting technique that was investigated. Response surfaces measuring depth of focus were generated from simulated data. The resolution and depth of focus capabilities of this phase shift technique were also measured by both experimental and simulated data.

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Richard D. Holscher, Bruce W. Smith, and Steve K. Brainerd "Response surface modeling of rim phase-shift masks", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150483

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