13 August 1993 Photoresists based on chalcogenide glasses for submicron lithography
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It is shown that the photosensitivity of photoresists based on chalcogenide glasses can be increased drastically (1000 times and more) using excitation by pulsed radiation of excimer laser. A model is developed that explains the increase in sensitivity. The main advantages of chalcogenide photoresists are discussed and conclusions are drawn on the prospects of these resists for submicron photolithography.
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Illana Bar, Illana Bar, Matvei Klebanov, Matvei Klebanov, Victor Lyubin, Victor Lyubin, Salman Rosenwaks, Salman Rosenwaks, S. Shtutina, S. Shtutina, V. Volterra, V. Volterra, } "Photoresists based on chalcogenide glasses for submicron lithography", Proc. SPIE 1972, 8th Meeting on Optical Engineering in Israel: Optoelectronics and Applications in Industry and Medicine, (13 August 1993); doi: 10.1117/12.151100; https://doi.org/10.1117/12.151100

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