11 May 1993 Recent development of low-voltage reactive-ion-plating deposition of optical thin films in China
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Proceedings Volume 1979, 1992 International Conference on Lasers and Optoelectronics; (1993) https://doi.org/10.1117/12.144124
Event: 1992 International Conference on Lasers and Optoelectronics, 1992, Bejing, China
Abstract
Various optical thin films of metal oxides and ITO have been deposited by low voltage reactive ion plating technique. Analysis of the resulting thin films shows that their microstructures are evidently improved.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Liying Han, Jiancun Gao, Jianchen Wang, "Recent development of low-voltage reactive-ion-plating deposition of optical thin films in China", Proc. SPIE 1979, 1992 International Conference on Lasers and Optoelectronics, (11 May 1993); doi: 10.1117/12.144124; https://doi.org/10.1117/12.144124
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