Laser Chemical Vapor Deposition Of Titanium Carbide

J. Mazumder; S. D. Allen

doi:10.1117/12.958023

24 January 1980 Laser Chemical Vapor Deposition Of Titanium Carbide

J. Mazumder, S. D. Allen

Proceedings Volume 0198, Laser Applications in Materials Processing; (1980) https://doi.org/10.1117/12.958023
Event: 23rd Annual Technical Symposium, 1979, San Diego, United States

Abstract

The chemical vapor deposition of titanium carbide using a 1.4 KW CO2 laser as the heat source is examined. The relationship between the laser power density and traverse speed on deposit thickness and properties is described. The laser chemical vapor deposited carbide coating is characterized by SEM, EDAX, optical microscopy and microhardness tests. Hardness up to 2800 Knoop is observed leading to the possibility of extremely wear resistant surface coatings. Advantages such as controllability of input energy and small heat affected zone resulting in little or minimum distortion open the door to a wide variety of selected area chemical vapor deposition processes.

Citation Download Citation

J. Mazumder and S. D. Allen "Laser Chemical Vapor Deposition Of Titanium Carbide", Proc. SPIE 0198, Laser Applications in Materials Processing, (24 January 1980); https://doi.org/10.1117/12.958023

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