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1 April 1993 Analyzing the thermal stability of CsI photocathodes with XPS
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Proceedings Volume 1982, Photoelectronic Detection and Imaging: Technology and Applications '93; (1993) https://doi.org/10.1117/12.142008
Event: Photoelectronic Detection and Imaging: Technology and Applications '93, 1993, Beijing, China
Abstract
The effects of vacuum-baking on the chemical state of CsI photocathodes are studied with x- ray photoelectron spectroscopy (XPS) in this paper. The experimental results indicate that when the vacuum-baking temperature is below 180 degree(s)C the chemical states of CsI photocathode are stable, but there is a sublimation of CsI with low rate in high vacuum. When the vacuum-baking temperature is higher than 180 degree(s)C, chemical shifts will occur.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kaisheng Tan, Zhiyong Pan, and Fengqin Liu "Analyzing the thermal stability of CsI photocathodes with XPS", Proc. SPIE 1982, Photoelectronic Detection and Imaging: Technology and Applications '93, (1 April 1993); https://doi.org/10.1117/12.142008
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