26 July 1993 Ultrahigh-power, femtosecond, ARF excimer laser system
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Proceedings Volume 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology; 198305 (1993) https://doi.org/10.1117/12.2308424
Event: 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 1993, Budapest, Hungary
Abstract
An ultrahigh-brightness ArF excimer laser system is described that is capable of generating pulse energies of 60 mJ (700 fs). The system utilizes a seed pulse generation scheme based on spectrally compensated sum-frequency mixing in BBO. Femtosecond gain characteristics of ArF are also discussed.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. Szabó, G. Szabó, } "Ultrahigh-power, femtosecond, ARF excimer laser system", Proc. SPIE 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 198305 (26 July 1993); doi: 10.1117/12.2308424; https://doi.org/10.1117/12.2308424
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