26 July 1993 New attenuated total reflection method for refractive index measurement of enhanced accuracy
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Proceedings Volume 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology; 198338 (1993) https://doi.org/10.1117/12.2308535
Event: 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 1993, Budapest, Hungary
Abstract
A novel reflection technique for refractive index determination of an optical layer (or multilayer) on a lower refraction index substrate is presented here. In the presence of absorption in at least one of the layers the observed characteristic minima enable high precision determination of the layer indices. The method is demonstrated on different polymer multi-layers. Accuracy limiting factors, such as surface roughness and thickness variation are also discussed.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Emöke Lörincz, "New attenuated total reflection method for refractive index measurement of enhanced accuracy", Proc. SPIE 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 198338 (26 July 1993); doi: 10.1117/12.2308535; https://doi.org/10.1117/12.2308535
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