23 July 1993 Diffractive optical elements for the infrared
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Proceedings Volume 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology; 19837P (1993) https://doi.org/10.1117/12.2308696
Event: 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 1993, Budapest, Hungary
Abstract
Diffractive optical elements (DOEs) tend to become severe competitors to conventional refractive optical elements, especially for monochromatic applications as in optical communication, optical interconnects and laser metrology. They are fabricated with the same tools as microelectronic devices, i. e., lithography and etching techniques. Hence integrated circuits and DOEs may be combined on the same chip - perhaps even together with micromechanic components, thus forming so called microsystems. We use laser lithography and reactive ion etching for the fabrication of DOEs. The performance of the elements is mainly limited by the lithography system. We report on our experiences with such a system.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Haidner, "Diffractive optical elements for the infrared", Proc. SPIE 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 19837P (23 July 1993); doi: 10.1117/12.2308696; https://doi.org/10.1117/12.2308696
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