23 July 1993 Ultrafast photography of shock waves originating from UV photo-ablated surface
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Proceedings Volume 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology; 19838T (1993) https://doi.org/10.1117/12.2308736
Event: 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 1993, Budapest, Hungary
Abstract
A new excimer laser micromachining projection microscope is described. This device enables a surface to be viewed at high magnification with a built-in facility for michromachining of the same surface according to a predetermined pattern_ The advantage of such a technique for both pattern generation, surface cleaning and mask correction is demonstrated on Al, Cu and W specimens with a spatial resolution better than 3µm.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zs. Bor, Zs. Bor, } "Ultrafast photography of shock waves originating from UV photo-ablated surface", Proc. SPIE 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 19838T (23 July 1993); doi: 10.1117/12.2308736; https://doi.org/10.1117/12.2308736
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