23 July 1993 Thresholds for surface imperfections
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Proceedings Volume 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology; 1983AK (1993) https://doi.org/10.1117/12.2308799
Event: 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 1993, Budapest, Hungary
Abstract
We report on the fabrication and measurement of refractive microlens arrays in photoresist. The production steps are shown in detail. A novel " base layer " technique is described which makes it possible to fabricate lower numerical apertures lenses in resist. The processing of melted microlens arrays starts with cylindrical islands of resist on a glass substrate. After the development in a wet chemical process the cylinders are melted on a hot plate. The surface tension forms the liquid into spherical shape which can be used as a microlens. The lens shape depends on the critical angle between the substrate and the resist at the circumference of the lens. The wave aberrations were measured in a Mach - Zehnder interferometer with phase shift capability. Based on the measurements point spread function and modulation transfer function are determined.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. R. Baker, "Thresholds for surface imperfections", Proc. SPIE 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 1983AK (23 July 1993); doi: 10.1117/12.2308799; https://doi.org/10.1117/12.2308799
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