23 July 1993 Thresholds for surface imperfections
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Proceedings Volume 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology; 1983AK (1993) https://doi.org/10.1117/12.2308799
Event: 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 1993, Budapest, Hungary
Abstract
We report on the fabrication and measurement of refractive microlens arrays in photoresist. The production steps are shown in detail. A novel " base layer " technique is described which makes it possible to fabricate lower numerical apertures lenses in resist. The processing of melted microlens arrays starts with cylindrical islands of resist on a glass substrate. After the development in a wet chemical process the cylinders are melted on a hot plate. The surface tension forms the liquid into spherical shape which can be used as a microlens. The lens shape depends on the critical angle between the substrate and the resist at the circumference of the lens. The wave aberrations were measured in a Mach - Zehnder interferometer with phase shift capability. Based on the measurements point spread function and modulation transfer function are determined.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. R. Baker, L. R. Baker, } "Thresholds for surface imperfections", Proc. SPIE 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 1983AK (23 July 1993); doi: 10.1117/12.2308799; https://doi.org/10.1117/12.2308799
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