23 July 1993 Detection of errors in microlithographic grating fabrication
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Proceedings Volume 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology; 1983AR (1993) https://doi.org/10.1117/12.2308806
Event: 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 1993, Budapest, Hungary
Abstract
The rotation method for the absolute testing of three flatsl is extendet by adding a second rotation of one of the flats2. This means that altogether five inter- ferograms of pairs of flats (positional combinations) are evaluated: three basic combinations and two rotational combinations. The effect of random measuring errors is minimized by fully applying least-squares methods. Here the addition of the second rotation leads to a substantial increase of accuracy of the results and enables the lateral resolution to be further enhanced. Measurements using a special phase-stepping Fizeau-interferometer were carried out. Flats of 200 mm diameter were tested. The lateral resolution is about 1/100 of the plate diameter.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Heissmeier, "Detection of errors in microlithographic grating fabrication", Proc. SPIE 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 1983AR (23 July 1993); doi: 10.1117/12.2308806; https://doi.org/10.1117/12.2308806
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