1 December 1993 Aircrew helmet design and manufacturing enhancements through the use of advanced technologies
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Proceedings Volume 1988, Display Systems; (1993) https://doi.org/10.1117/12.164703
Event: Electronic Imaging Device Engineering, 1993, Munich, Germany
Abstract
With the development of helmet mounted displays (HMD) and night vision systems (NVS) for use in military and civil aviation roles, new methods of helmet development need to be explored. The helmet must be designed to provide the user with the most lightweight, form fitting system, while meeting other system performance requirements. This can be achieved through a complete analysis of the system requirements. One such technique for systems analysis, a quality function deployment (QFD) matrix, is explored for this purpose. The advanced helmet development process for developing aircrew helmets includes the utilization of several emerging technologies such as laser scanning, computer aided design (CAD), computer generated patterns from 3-D surfaces, laser cutting of patterns and components, and rapid prototyping (stereolithography). Advanced anthropometry methods for helmet development are also available for use. Besides the application of advanced technologies to be used in the development of helmet assemblies, methods of mass reduction are also discussed. The use of these advanced technologies will minimize errors in the development cycle of the helmet and molds, and should enhance system performance while reducing development time and cost.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David P. Cadogan, David P. Cadogan, Alan E. George, Alan E. George, Edward R. Winkler, Edward R. Winkler, } "Aircrew helmet design and manufacturing enhancements through the use of advanced technologies", Proc. SPIE 1988, Display Systems, (1 December 1993); doi: 10.1117/12.164703; https://doi.org/10.1117/12.164703
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